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Micro electronics

Clean Air, Activated Carbon Solutions
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Problems with gaseous contaminants in micro electronics industry

  • Outgassing from materials, process equipment, or cleaning chemicals such as VOCs, Ammonia, Silane, Hydrogen sulphide causing chemical reaction on wafer surfaces leading to defects or compromised circuit functionality
  • Corrosive gases from etching process cause crrosion on sensitive components including metal interconnects & equipment
  • Hydrocarbon contaminations form organic residue on wafers causing defects and reduce devise reliability
  • Ammonia and Amine contamination cause lense hazing in lithography and patterning defects in photo resist material

Implications of gaseous contaminants in micro electronics industry

  • Reduced product yield, Compromised device reliability, Higher production cost, Equipment degradation, Delayed innovation and production

How can we Help?

Our tailor made advance filtation systems help remove gaseous contaminants from various functional areas of micro electronics set up such as, air intake system, exhaust systems, gas delivery pipelines, photolithography area, etching process area,

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